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1. Headway Research Spin Coater is used to spin on a uniform, thin film of photoresist on the wafers. Because the photoresist is light-sensitive, all work is done under red or yellow light in the darkroom. |
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2. After the photoresist has been applied and softbaked to remove solvent, a mask is carefully positioned over the substrate using a microscope and a contact mask aligner (this can be challenging in the darkroom!). Both the substrate and the mask are held in close contact by applied vacuum. |
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3. For aligning features a shorter length scales or for more complex patterns, the new OAI Model 200 contact mask aligner is used. It has excellent illumination, precision alignment, and automated exposure control. After using the OAI, you'll never go back to the manual aligner. |